Structural Investigation of the Ag-Ni-Si Silicide Films Formed at 850±C by RTA on Si(100) Substrates

Makaleler > Tam Makale · 2010

Yazarlar: Gökhan UTLU, Nurcan Artunç

Balkan Physics Letters, Uluslararası, 2010, cilt 181041, ss 308-317

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